The UVO method is a photo-sensitized oxidation process in which the contaminant molecules of photoresists, resins, human skin oils, cleaning solvent residues, silicone oils, and flux are excited and/or dissociated by the absorption of short-wavelength UV radiation. Atomic oxygen is simultaneously generated when molecular oxygen is dissociated by 184.9 nm and ozone by 253.7 nm UV. The 253.7 nm UV radiation is absorbed by most hydrocarbons and also by ozone. The products of this excitation of contaminant molecules react with atomic oxygen to form simpler, volatile molecules which desorb from the surface. Therefore, when both UV wavelengths are present atomic oxygen is continuously generated, and ozone is continually formed and destroyed. 

By placing properly pre-cleaned samples within five millimeters of an ozone producing UV source, such as the low pressure mercury vapor grid lamp in the UVO-Cleaner®, near atomically clean surfaces can be achieved in less than one minute. The process does not damage sensitive device structures of MOS gate oxide. 

The advantages of UVO-Cleaner® cleaning is it is a damage free alternative. Jelight Company’s UVO-Cleaner® is completely manufactured from polished stainless steel, and is equipped with a digital timer to control UV exposure time. The UVO-Cleaner® also features an automatic shut-off switch to prevent accidental exposure to UV. Jelight’s UVO-Cleaner® has a high-intensity low pressure mercury vapor UV grid lamp for optimum generation of atomic oxygen, ozone, and short-wave UV radiation for effective cleaning. To maximize the cleaning rate, parts to be cleaned are placed on an adjustable tray. The unit is also equipped with inlet ports for oxygen or other gas media, and an exhaust port for hookup to the exhaust system.

Take a look at the table below of all the UVO-Cleaner® models Jelight Company offers:


Unit dimensions can be tailored/customized per customer needs. Additional charges may apply.

* Units are available in following power configurations:
100V 50/60Hz

**Ozone concentration and the distance between the sample and the UV source can greatly affect the cleaning rate.

If you have any questions or inquiries, please email us or call at (949) 380-8774.


  • High Intensity Grid Lamp
  • Stainless Steel Housing
  • Affordable
  • Digital Timer for Simple, Repeatable results
  • Stainless Steel Tray with Optional Rubber Mat
  • Height Adjustable Tray for substrates up to 1 in / 25mm Tall
  • Automatically Cleans and Improves Coating Adhesion
  • Media Inlet Port
  • Exhaust Port with Optional Ozone Killer and Blower

Common Applications:

  • Ultraviolet Curing
  • Surface Patterning
  • Ozone Etching
  • Microscope Slides
  • Cleaning Lenses and Optics
  • Preparation for Thin Film Deposition
  • AFM Probe Cleaning/ Tip Sharpening
  • Improvement of Surface Wettability
  • Cleaning Quartz and Ceramic Surfaces
  • Semiconductor Surface Oxidation and Preparation

Optional Equipment:

All units are available with Ozone Killer and Blower sets, that allow for the use of the unit without the need for external exhaust. The Ozone Killer will dissociate trace amounts of ozone in the exhaust, while the Blower will augment the exhaust flow rate.

Radiometers and Detectors are also available to measure lamp intensities. 

Our compact Model 24 UVO Cleaner® with an attached ozone killer and blower. 

Our compact Model 24 UVO Cleaner® with an open tray and attached ozone killer and blower.


UVO-Cleaner® Studies Using Jelight Company Inc. Products

Jelight Company UVO-Cleaners have been used extensively in the academic and research fields for decades. Please click below to expand a non-comprehensive list of studies using Jelight Company products.